1
Zeta potential and photocatalytic activity of nitrogen doped TiO2 thin films

2
Nitrogen doped TiO2 films were fabricated by annealing anatase TiO2 films in gaseous NH3.

3
Nitrogen atoms in these films were substitutionaly introduced into oxygen sites of TiO2 lattice.

4
We have evaluated the zeta potential of these films and have found that it became negative with the amount of nitrogen doping.

5
The photocatalytic decomposition of gaseous 2-propanol was examined under light-limited conditions, and the quantum yield (QY) was estimated while illuminating with ultraviolet (UV) and visible light (VIS).

6
The QY values for the nitrogen doped TiO2 film were 15.4% (UV) and 0.41% (VIS), whereas those for the pure TiO2 film were 18.4% (UV) and 0% (VIS).

7
In addition, the photocatalytic decomposition of ethylamine ions (CH3CH2NH3+) was evaluated in an aqueous solution under UV illumination in a light-rich condition.

8
Consequently, the decomposition rate of the nitrogen doped TiO2 for aqueous ethylamine ions was higher than that of the pure TiO2 because the surface of the nitrogen doped TiO2 film was negatively charged and cationic ethylamine ions were efficiently adsorbed on its surface.

9
The surface structure and the band structure of the nitrogen doped TiO2 are discussed in this paper.

Introduction

10
When UV light is illuminated on TiO2, electron and hole pairs are generated in it and they reduce and oxidize adsorbates on the surface, respectively.1–4

11
Moreover, we recently reported that the surface of TiO2 becomes highly hydrophilic under UV illumination.5–7

12
A great deal of research has been conducted on these reactions and various TiO2 coated substrates have been applied to water and air purification,8–10 anti-bacterial agents,11 and self-cleaning surfaces.12,13

13
Thus far, these techniques are mainly applied to outdoor use since the photocatalytic reaction for these applications requires sufficient UV source, which is typically provided by the sun.

14
The band gap of TiO2 (anatase) is 3.2 eV and the photocatalytic reaction proceeds under the UV illumination with wavelengths shorter than λ < 380 nm, which corresponds to the band gap energy.

15
Numerous studies have attempted to extend the photosensitivity of TiO2 towards the visible light region by coupling with organic dye sensitizers14,15 or metal oxides,16–20 by doping with transition metals,21–23 and by reducing with hydrogen.24

16
Recently, visible light responses have been reported by nitrogen doping into a TiO2 lattice.25

17
R. Asahi et al. have reported that the substitutional doping of nitrogen into TiO2 lattice is effective because the N-2p states help narrow the band-gap by mixing with O-2p states.26,27

18
Using first-principle calculations and X-ray photoemission spectroscopy, they concluded that nitrogen doping into substitutional sites of TiO2 is indispensable for band-gap narrowing and photocatalytic activity.25

19
We previously reported the photocatalytic activities of nitrogen doped TiO2 powders under visible light and have concluded that the isolated N-2p narrow band above the O-2p valence band is responsible for the visible light response, when nitrogen is lightly doped (up to about 1%) into oxygen sites.28,29

20
Nitrogen doping into TiO2 lattice effectively controls the electric structure and is expected to control the surface structure of TiO2.

21
The present paper focuses on the zeta potential of nitrogen doped TiO2.

22
The zeta potential depends on the atomic arrangement of TiO2 surface and is crucial in controlling the adsorption properties of TiO2 surfaces.

23
Substitutionally nitrogen doped TiO2 films are fabricated and the zeta potentials and photocatalytic oxidation activities are evaluated.

24
The surface and the band structures of nitrogen doped TiO2 are also discussed.

Experimental

Preparation of thin films

25
Pyrex glass plates coated with SiO2 were used as substrates for preparing thin films.

26
Prior to coating the films, the substrates were ultrasonically degreased in ethanol for 30 min and then thoroughly rinsed with distilled water.

27
These substrates were dipped into a titanium tetraisopropoxide solution (NDH-510C, Nihon Soda Co., Tokyo, Japan) and were slowly removed from the solution at a fixed rate of 15 cm min−1 under dry nitrogen.

28
These samples were calcined at 500 °C for 30 min in air to obtain pure TiO2 films with anatase phase.

29
The dip-coating and calcination procedures were repeated six times, which yielded films ca.

30
600 nm thick.

31
Afterwards, the films were annealed in gaseous ammonia (NH3) for 1 h at 400, 600, or 700 °C.

Characterization

32
The crystal phases of the thin films were evaluated by the grazing angle method of X-ray diffraction with Cu Kα rays (XRD: model RINT-2100, Rigaku Co., Tokyo, Japan).

33
The incident angle was fixed at 0.5° and 2θ was scanned in the range of 10–70°.

34
The surface morphologies and cross sections of thin films were observed using a scanning electron microscope (SEM: model S-4200, Hitachi Co., Tokyo, Japan).

35
X-ray photoelectron spectroscopy with Mg Kα X-rays (XPS: model AXIS-HS, Kratos, Manchester, UK) evaluated the amount and states of the nitrogen atoms in these films.

36
The photoelectrons of the N-1s, Ti-2p, O-1s and C-1s orbitals were recorded with a takeoff angle of 45°.

37
The internal reference for the absolute binding energy was the C-1s peak of hydrocarbon contamination at 284.8 eV.

38
The integrated peak areas of each orbital were calculated after subtracting the non-linear background.

39
Quantitative analysis was based on the peak area multiplied by sensitivity factors supplied by Kratos, which considered the geometric configuration of the apparatus.

40
In addition, the depth profiles of each element in the thin film were measured, following Ar+ ion sputtering with a 4.5 kV beam voltage.

41
The ultraviolet-visible absorption spectra of the thin films were recorded on a spectrophotometer (UV-3100, Shimadzu Co., Kyoto, Japan).

42
The absorption percentage (α, %) was obtained by measuring the transmittance (T, %) and reflectance (R, %) of the thin films, where α = 100 − (T + R).

43
A 60 mm integrating sphere was used for the measurement, since the scattering effect was taken into account for the film absorption.

44
The zeta potentials of the thin film surfaces were measured by the monitor particle method30 using an electrophoretic light scattering spectrophotometer (ELS-6000, Otsuka Electronics Co., Oosaka, Japan).

45
A quartz cell was used to measure the electrophoretic mobility of polystylene latex reference particles, which had an average diameter of 520 nm.

46
The cell was filled with a NaCl aqueous solution (0.1 mmol dm−3) containing latex reference particles.

47
The pH value was adjusted using aqueous solutions of NaOH (0.1 mmol dm−3) and HCl (0.1 mmol dm−3).

Photocatalytic activities

48
The photocatalytic activities of the thin films were evaluated by monitoring the decomposition of gaseous 2-propanol in air (25 °C).

49
2-Propanol was selected as the reactant because the oxidation of 2-propanol to acetone can determine the quantum yield.31

50
A thin film, 70 × 50 mm, was placed in a 0.8 dm3 Pyrex glass vessel.

51
An O2(20%)–N2(80%) gas mixture, which was passed through a 30 °C water humidifier in order to adjust the relative humidity to 50%, was filled in a vessel.

52
The headspace (20 cm3) of glass bottle reservoir, which contained liquid 2-propanol, was injected into the Pyrex glass vessel using a syringe.

53
The initial concentration of 2-propanol was adjusted to 120 ppm.

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The photocatalytic decomposition of gaseous 2-propanol was evaluated while illuminating with ultraviolet (UV) and visible (VIS) light.

55
A 10-W black light bulb (Toshiba Co., Tokyo, Japan) provided the UV illumination.

56
The source for VIS illumination was a 250 W xenon lamp (LA-250Xe, Hayashi Watch-works Co. Ltd., Tokyo, Japan), which was used in conjunction with an optical fiber coupler, an UV cutting filter (Y-43, Toshiba Co. Ltd., Tokyo, Japan) and an IR cutting filter (V-40, Toshiba Co. Ltd., Tokyo, Japan).

57
The number of absorbed photons in each film was fixed at 2.0 × 1014 (quanta s−1 cm−2) regardless of the illumination source.

58
The amount of absorbed photons (Ia) was determined by eqn. (1). where I0 and α are the incident photon flux and the absorption percentage, respectively.

59
The incident photon flux (I0) was measured by a spectro-radiometer (USR-40D, Ushio Co., Tokyo, Japan) and the absorption percentage (α) was obtained from UV-Vis spectra.

60
The concentrations of 2-propanol, acetone, and carbon dioxide (CO2) were measured by a photoacoustic multi-gas monitor (model 1312, Innova, Ballerup, Denmark), which had a detection limit of approximately 0.1 ppm.

61
The photocatalytic decomposition of ethylamine ions (CH3CH2NH3+) in an aqueous solution was also evaluated.

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Thin films were immersed in an aqueous solution of ethylamine ions.

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After bubbling N2 through the solution for 30 min, ultraviolet light illuminated the films.

64
A capillary electrophoresis system (HP-3D, Hewlett Packard Co., California, USA) measured the concentration of ethylamine ions.

65
The initial concentration of ethylamine ions was 10 ppm and the pH value of solution was 5.5 (20 °C).

66
The UV illumination was provided by a 10-W black light bulb (Toshiba Co., Tokyo, Japan).

67
The light intensity of UV illumination was 0.5 mW cm−2 or 1.0 mW cm−2, measured by a spectro-radiometer (USR-40D, Ushio Co., Tokyo, Japan).

Results and discussion

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Fig. 1 shows XRD patterns for the thin films.

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The crystal structures of pure TiO2 and the nitrogen doped TiO2 films annealed in NH3 below 600 °C all exhibited a single anatase phase.

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Annealing NH3 at 700 °C, however, changed the nitrogen doped TiO2 crystal phase to the cubic TiN phase.

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Fig. 2 shows SEM images for the surface of the thin films and the cross sections of pure TiO2 (E) and TiN film (F).

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Regardless of the annealing temperature in gaseous NH3, the surfaces exhibited nearly identical surface morphologies.

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The diameters of TiO2 particles were approximately 30 nm.

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The films, which were 600 nm thick, were homogeneously deposited on glass substrates without cracks or pinholes.

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To investigate the doping density and state of nitrogen atoms, XPS spectra for N-1s band were measured (Fig. 3).

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A peak with the binding energy of 396 eV was observed for the nitrogen doped TiO2 films and the peak intensity depended on the annealing temperature in NH3.

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It has been reported that the peak at 396 eV is assigned to Ti–N bonding, whereas the peaks at 402 and 404 eV are assigned to molecularly chemisorbed N2.32

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Prior to our XPS measurement, the surface of thin films was etched by Ar+ ion sputtering for 1 min, which eliminated chemisorbed or physisorbed N2 molecules on the surface.

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The XPS results indicate that the nitrogen atoms in the thin films were substitutionally doped into oxygen sites of TiO2 lattice.

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The doping densities of nitrogen atoms versus titanium atoms (N/Ti atom %) were 0% (pure TiO2), 0.9% (NH3 400 °C), 2.3% (NH3 600 °C), 36.4% (NH3 700 °C).

81
The depth profiles of the nitrogen atoms in these films were evaluated using Ar+ ion sputtering, which indicated that the oxygen atom sites were homogeneously substituted by nitrogen atoms.

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Fig. 4 shows the absorption spectra of thin films.

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Nitrogen doped TiO2 films (annealed in NH3 at 400 °C and 600 °C) had shoulder peaks in the visible light region around 390–450 nm.

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The pure TiO2 film does not absorb the visible light since the band gap of anatase type TiO2 is 3.2 eV.33

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The TiN film was not transparent, owing to its metallic property.

86
Fig. 5 shows the surface zeta potential versus pH for a pure TiO2 film and a film annealed in NH3 at 600 °C.

87
The pH of the isoelectric point (IEP) for the pure TiO2 film was 5.8.

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The IEP for anatase TiO2 particles were previously determined by other procedures and ranged from 5.1 to 6..734–37

89
Therefore, the value of the pure TiO2 in the present paper is consistent with those measured by other procedures.

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However, the zeta potential of a nitrogen doped TiO2 film negatively shifted and the IEP decreased.

91
Table 1 lists the zeta potentials for each film at a pH of 5.5.

92
When the crystal phase remained anatase TiO2, the zeta potentials became more negative as the amount of nitrogen doping increased.

93
When the crystal phase was transformed to the cubic TiN phase, the zeta potential, however, aproached zero potential (−4.65 mV) at a pH of 5.5.

94
Previous studies reported that the IEP for TiN particles ranged from 4.0 to 5..038–40

95
Thus, the IEP of the TiN film in the present study is consistent with the literature.

96
It is noteworthy that the surface zeta potentials of the nitrogen doped TiO2 films were more negative than that of pure TiO2, which indicates that the surface of nitrogen doped TiO2 films was highly acidic.

97
It is known that OH groups on the TiO2 surface at terminal sites and those at bridging sites act as basic and acidic sites, respectively.41

98
The reported pKa value for OH groups at the terminal sites of TiO2 is 12.7 and that for OH groups at bridging sites is 2..934,42

99
Previous studies also reported that amounts of OH groups at terminal sites and those at bridge sites are nearly identical.43,44

100
Therefore, the IEP of TiO2 is a neutral value and the TiO2 exhibits amphoteric properties.

101
The surface of nitrogen doped TiO2 films in this study, however, was highly acidic.

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Fig. 6 shows a possible surface structure for nitrogen doped TiO2.

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Our XPS results indicated that the oxygen sites in the TiO2 lattice were substituted by the doped nitrogen atoms.

104
Previous studies have reported that OH groups at terminal sites act as Brønsted acid sites on a TiO2 surface.45

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The strength of the O–H bonds strongly affects the surface acidity.

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The strength between O–H bonding on metal oxides depends on the electronegativity of the metal ions, i.e. the strength between O–H bonding depends on the polarization of covalent electron pairs.46,47

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It is presumed that the N–H bonding is weaker than the O–H bonding since the electronegativity of nitrogen (3.0) is less than oxygen (3.5).

108
Therefore, the N–H sites of the nitrogen doped TiO2 surface act as acidic sites.

109
In order to fully discuss the surface acidity of nitrogen doped TiO2, a comprehensive study on the states and amount of OH or NH groups should be conducted.

110
The results of zeta potentials obtained in the present study, however, indicate that nitrogen atoms play an important role in controlling the surface adsorptive properties.

111
Next, we have evaluated the photocatalytic decomposition of gaseous 2-propanol under light-limited conditions,31 to estimate the efficiency for the photocatalytically charged separation.

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Fig. 7 shows the concentration changes of gaseous 2-propanol, acetone, and CO2 for a pure TiO2 film under UV illumination.

113
After 30 min, which was the time required for equilibrium between gaseous and adsorbed 2-propanol to be achieved, UV light illumination was initiated.

114
The amount of generated acetone was equivalent to the amount of decomposed 2-propanol and very little CO2 was produced.

115
The amount of CO2 was too small and insignificant to be considered.

116
The oxidation reaction from 2-propanol to acetone is not a chain reaction.48,49

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Hence, the quantum yield (QY) was calculated using eqn. (2).

118
The number of absorbed photons obtained from eqn. (1) was fixed at 2.0 × 1014 (quanta s cm−2) under UV as well as VIS illumination.

119
Table 2 lists the QY.

120
When illuminating with UV light, the pure TiO2 film exhibited the highest QY and the QY decreased as the extent of nitrogen doping increased.

121
Creating electron hole recombination centers such as oxygen vacancies50 caused the decrease in QY under UV illumination because the annealing procedure in a gaseous NH3 atmosphere is very reductive.

122
Due to the metallic properties of the TiN film, which was obtained by annealing in NH3 at 700 °C, it did not display photocatalytic activity even under UV illumination.

123
In contrast, when illuminating with VIS light, the nitrogen doped TiO2 films exhibited photocatalytic activity, but the pure TiO2 film did not.

124
However, the QY values under VIS illumination were much lower than those obtained with UV illumination, although the number of absorbed photons was identical regardless of the illumination source.

125
These results indicate that the photogenerated holes produced by the VIS light are localized at isolated levels between the valence and conduction bands.

126
If the N-2p levels were mixed with O-2p orbital and the band-gap narrowed, then the photogenerated holes in the valence band would diffuse to the upper edge of the valence band by a radiative process.

127
In these conditions, the oxidation power of photogenerated holes was supposed to be identical for both UV and VIS illumination.

128
However, our experimental data exhibited that the QY of the nitrogen doped TiO2 film under VIS illumination was much lower than that under UV illumination.

129
One possible speculation for the origin of the visible light activity is the oxygen vacancies.

130
A previous study reported that oxygen vacancy states of TiO2 are located between 0.75 to 1.18 eV, which is below the minimum level of the conduction band.51

131
Therefore, the reduced TiO2−x can absorb a broad range of visible light above 500 nm.

132
Indeed, nitrogen doped TiO2, which was annealed in NH3 at 600 °C, absorbed visible light above 500 nm.

133
The QY value under UV illumination was much lower than the pure TiO2 because the oxygen vacancies act as electron-hole recombination centers.50

134
In contrast, nitrogen doped TiO2 annealed in NH3 at 400 °C and pure TiO2 did not display optical absorption above 500 nm.

135
The UV-Vis spectrum of this film showed an absorption shoulder in the visible light region (390–450 nm), indicating that the absorption shoulder was due to isolated levels that consisted of N-2p orbitals in the band gap of TiO2.

136
We previously reported the optical absorption properties and QY values for nitrogen doped TiO2 powders and concluded that the isolated narrow band of N-2p orbitals, which is formed above the valence band, is responsible for the visible light activity.29

137
Fig. 8 shows the assumed band structure of nitrogen doped TiO2.

138
The isolated levels of the N-2p orbitals are situated above the valence band.

139
Thus, holes produced by the VIS illumination are localized and have a slower mobility than those produced by UV illumination.

140
Consequently, the photocatalytic activity under VIS illumination is much lower than that under UV illumination.

141
Although the QY of the nitrogen doped TiO2 under VIS illumination was much lower than that under UV illumination, we have found the intriguing property of its surface acidity.

142
The surface acidity plays an important role in determining its adsorptive property.

143
Finally, we have evaluated the photocatalytic decomposition of aqueous ethylamine ions (CH3CH2NH3+) under light-rich conditions.

144
Fig. 9 shows the changes in ethylamine ions under UV illumination for pure TiO2 and nitrogen doped TiO2 (annealed in NH3 at 400 °C).

145
Previous studies reported that TiO2 photocatalyst could decompose ethylamine ions and produce several intermediates.52

146
It has also been reported that these intermediates could be completely mineralized into CO2, H2O, and HNO3 under UV illumination.52

147
In the previous study, the decomposition rate of the nitrogen doped TiO2 film was faster than those of the pure TiO2 film.

148
In either film the decomposition rate was independent of the light intensity, indicating that the photocatalytic reaction proceeds under light-rich condition.

149
As listed in Table 1, the zeta potentials at pH of 5.5 for pure TiO2 and nitrogen doped TiO2, which was annealed at 400 °C, were +15.5 and −46.9 mV, respectively.

150
The pKa value of ethylamine is 10.63, thus almost all the ethylamine molecules (CH3CH2NH2) were dissociated into ethylamine ions (CH3CH2NH3+) in an aqueous solution.

151
Ethylamine ions are positively charged in an aqueous solution at a pH of 5.5 and are supposed to be preferentially adsorbed onto the negatively charged surface of the nitrogen doped TiO2.

152
The concentration of ethylamine ions was very low (10 ppm), thus, the photocatalytic decomposition of these ions was provided by the light-rich conditions.

153
Under light-rich conditions, decomposition rates depend on the adsorptive property on the surface.

154
Therefore, it is reasonable that the decomposition rate of the nitrogen doped TiO2 was higher than that of the pure TiO2 under UV illumination, even though the QY value of the nitrogen doped TiO2 (15.4%) obtained by the oxidation reaction of gaseous 2-propanol was slightly less than that of the pure TiO2 (18.5%) under UV illumination with the light-limited conditions.

155
These results are quite interesting from not only a scientific standpoint, but also from an industrial one.

156
Besides ethylamine ions, it is possible that nitrogen doped TiO2 can decompose other compounds and this photocatalyst has potential applications in water or air purification.

Conclusion

157
We have fabricated nitrogen doped TiO2 films and have discovered that their zeta potentials became negative with the amount of nitrogen doping.

158
The zeta potential of photocatalysts plays an important role in the adsorption property of aqueous contaminants.

159
The effects of negatively charged nitrogen doped TiO2 surfaces were investigated by evaluating the photocatalytic decomposition of aqueous cations (CH3CH2NH3+) under UV illumination with light-rich conditions.

160
The decomposition rate of nitrogen doped TiO2 was higher than that of the pure TiO2 because aqueous cations preferentially adsorbed onto the negatively charged surface of nitrogen doped TiO2.

161
To date surface state details of nitrogen doped TiO2 are unclear, but are currently under intensive investigation.

162
The present study, however, is quite valuable because it has the potential for scientific and industrial applications.

163
Nitrogen doped TiO2 can efficiently adsorb the cations, owing to its negatively charged surface.

164
Therefore, it is possible that this unique material will be used for water or air purification.